CEMS and SEM studies of the ion-beam mixed Ni−Sn and Al−Sn systems
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Metallic119Sn was vapour deposited on Al and Ni substrates to form layers about 40nm thick and subsequently irradiated with 100keV Xe+ at fluences 1, 5 and 10·1015 Xe+/cm2. Irradiation with 100keV N+ at 5·1016N+/cm2 fluence was also accomplished on an Al sample on which a layer of 100nm119Sn was previously electrodeposited. Surface evolution of the deposited layers due to irradiation has been observed by SEM and loss of Tin due to sputtering has been evidenced by EDX microanalysis. Changes of chemical structure at the irradiated surfaces have been followed by CEMS: β-Sn, SnO, SnAl2O4, SnO2 and SnAl2O5 or β-Sn, dissolved Tin in Nickel, SnO2, Ni3Sn and Ni3Sn2 phases were recognized on the surface of Aluminium and Nickel substrates respectively.
KeywordsAluminium Nickel Thin Film SnO2 Ni3Sn
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