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Mössbauer spectroscopy study surface structure of Si implanted by57Fe

  • Implantation Radiation Damage after Effects
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Abstract

Mossbauer spectroscopy, RBS and Infrared absorbed spectroscopy (IAS) analysis were carried out for the single crystal Si and amorphous Si both implanted by57Fe. Mossbauer spectra were fitted by separated and continuous spectrum for single crystal Si and amorphous Si, respectively. Some interesting information of the chemical characteristics around the implanted ions were obtained.

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References

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Authors and Affiliations

  1. Department of physics, Qinghua University, Beijing, China

    Q. Wang, Zhang Xiufang, Gao Naifei & Guo Youjiang

Authors
  1. Q. Wang
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  2. Zhang Xiufang
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  3. Gao Naifei
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  4. Guo Youjiang
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Wang, Q., Xiufang, Z., Naifei, G. et al. Mössbauer spectroscopy study surface structure of Si implanted by57Fe. Hyperfine Interact 42, 1021–1024 (1988). https://doi.org/10.1007/BF02395564

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  • DOI: https://doi.org/10.1007/BF02395564

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