Abstract
A study of the effects of changes in composition, film thickness, substrate deposition temperature and annealing on the optical properties of MoO3-In2O3 is presented. The results are found to be compatible with the reduction in the value of optical energy gap of these materials as the molar fraction of In2O3 in the MoO3 thin film increases. This decrease of optical gap may be attributed to the incorporation of In(III) ions in an MoO3 lattice. The decrease in optical band gap with increasing thickness may be interpreted in terms of the incorporation of oxygen vacancies which are also believed to be the source of conduction electrons in the MoO3-In2O3 complex. The decrease of band gap with increasing substrate temperature may be attributed to the enhanced ordering of the samples and the decrease of band gap with annealing may be attributed to a reduction in the concentration of lattice imperfections.
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Anwar, M., Hogarth, C.A. The optical absorption edge in amorphous thin films of MoO3-In2O3 . J Mater Sci 24, 3673–3678 (1989). https://doi.org/10.1007/BF02385755
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DOI: https://doi.org/10.1007/BF02385755