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Thin film solid oxide fuel cells

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Abstract

We have investigated the deposition of 91% ZrO2 − 9% Y2O3 thin films by a variety of sputtering techniques for the application as electrolytes in thin film solid oxide fuel cells. The deposition by RF sputtering was accomplished by using an oxide target of the desired composition. The deposition rate in these initial tests was limited to 0.5 µm/hr and the morphology of the film was substantially modified by deposition rate and substrate temperature. Using DC magnetron sputtering we deposited metallic films from a metallic target with the desired chemical composition. We introduced oxygen into the sputtering chamber to reactively deposit the desired 91% ZrO2 − 9% Y2O3 thin films; however, we encountered problems with target oxidation and growth rate reproducibility. We subsequently demonstrated that controlled oxidation of the metallic films could result in adhering, non porous yttria stabilized zirconia films.

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Authors and Affiliations

  1. Laboratoire de Genie des Materiaux, ISITEM, La Chantrerie, F-Nantes, France

    P. Charpentier, P. Fragnaud & D. M. Schleich

  2. Direction de la Recherche, Gaz de France, F-La Plaine Saint-Denis, France

    C. Lunot

Authors
  1. P. Charpentier
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  2. P. Fragnaud
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  3. D. M. Schleich
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  4. C. Lunot
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Charpentier, P., Fragnaud, P., Schleich, D.M. et al. Thin film solid oxide fuel cells. Ionics 2, 312–318 (1996). https://doi.org/10.1007/BF02376039

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  • DOI: https://doi.org/10.1007/BF02376039

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