Abstract
A description is given of the chief stages and principles of the development (over more than a decade) of an electromagnetic impedance method for the investigation and parameter control of semiconducting layers —epitaxial, diffusion structures, and metal film dielectric systems of electronic engineering — during their interaction with the fields of coaxial, waveguide, and capacitative-inductive radiators of various configurations in the millimeter, centimeter, and meter wavelength ranges.
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Additional information
Translated from Izmeritel'naya Tekhnika, No. 3, pp. 35–37, March, 1996.
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Grigulis, Y.K., Avgutsevich, B.I., Poris, U.R. et al. Electromagnetic impedance method of monitored semiconducting layers and studying biological objects. Meas Tech 39, 281–284 (1996). https://doi.org/10.1007/BF02374580
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DOI: https://doi.org/10.1007/BF02374580