Skip to main content
Log in

Electromagnetic impedance method of monitored semiconducting layers and studying biological objects

  • Linear and angular measurements
  • Published:
Measurement Techniques Aims and scope

Abstract

A description is given of the chief stages and principles of the development (over more than a decade) of an electromagnetic impedance method for the investigation and parameter control of semiconducting layers —epitaxial, diffusion structures, and metal film dielectric systems of electronic engineering — during their interaction with the fields of coaxial, waveguide, and capacitative-inductive radiators of various configurations in the millimeter, centimeter, and meter wavelength ranges.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Similar content being viewed by others

References

  1. Yu. K. Grigulis, Proceedings of ACTA IMEKD, Budapest, 317 (1958).

  2. Yu. K. Grigulis, “High frequency electromagnetic instruments for monitoring layered components,” Dissertation Abstract, Riga (1965).

  3. Yu. K. Grigulis, An Electromagnetic Method of Analyzing Layered Semiconducting and Metallic Structures [in Russian], Zinatne, Riga (1970).

    Google Scholar 

  4. Yu. K. Grigulis, “Methods and devices of radiowave impedance industrial monitoring of semiconducting thin-film structures in radioengineering and communication instruments,” Dissertation Abstract, Leningrad (1990).

  5. E. E. Aboltin, “Non-destructive monitoring of some physical properties of two-layer superconductors at super high frequencies,” Dissertation Abstract, Riga (1968).

  6. E. E. Aboltin, Yu. K. Grigulis, and V. M., Porin'sh, Semiconductors and their Applications in Electrical Engineering [in Russian], Ziratne, Riga (1970).

    Google Scholar 

  7. Yu. K. Grigulis, and V. S. Fastritskii, Radio Engineering and the Metal Shaping Industry [in Russian], TsBTI, Riga (1960), p. 29.

    Google Scholar 

  8. Yu. K. Grigulis, and I. G. Matise, Pioneering and Scientific, Technical and Industrial Experience [in Russian], GOSNITI, Moscow (1963), p. 33.

    Google Scholar 

  9. V. V. Gavrilin, Yu. K. Grigulis, and V. M. Porin'sh, Electromagnetic Radiowave Instruments for Monitoring La in Semiconducting Structures [in Russian], Zinatne, Riga (1982).

    Google Scholar 

  10. V. V. Gavrilin, “Investigations and the development of electromagnetic methods for monitoring thin-film conducting structures,” Dissertation Abstract, Riga (1978).

  11. U. R. Poris, “A study of radiowave measuring transformers, and the development of instruments for monitoring parameters of thin-film conducting structures in vacuum plants,” Dissertation Abstract, Moscow (1987).

  12. Ya. E. Silin'sh, “The development of waveguide aperture radiators and instruments for monitoring thin-film semiconducting structures,” Dissertation Abstract, Riga (1987).

  13. B. I. Avgutsevich, “The development of radiowave methods and means for multiparameter industrial monitoring of semiconducting epitaxial structures in radioengineering devices,” Dissertation Abstract, Riga (1977).

  14. V. M. Porin'sh, “Studies of semiconducting structures by an electromagnetic impedance methods,” Dissertation Abstract, Riga (1977).

Download references

Authors

Additional information

Translated from Izmeritel'naya Tekhnika, No. 3, pp. 35–37, March, 1996.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Grigulis, Y.K., Avgutsevich, B.I., Poris, U.R. et al. Electromagnetic impedance method of monitored semiconducting layers and studying biological objects. Meas Tech 39, 281–284 (1996). https://doi.org/10.1007/BF02374580

Download citation

  • Issue Date:

  • DOI: https://doi.org/10.1007/BF02374580

Keywords

Navigation