References
H. Utsugi, A. Endo, N. Suzuki andK. Ono,Nippon Kagaku Kaishi 1985 (1985) 1265.
P. Bowen, J. G. Highfield, A. Mocellin andT. A. Ring,J. Amer. Ceram. Soc. 73 (1990) 724.
M. Egashira, Y. Shimizu andS. Takatsuki,J. Mater. Sci. Lett. 10 (1991) 994.
A. Abid, R. Bensalem andB. J. Sealy,J. Mater. Sci. 21 (1986) 1301.
Y. Shimizu, S. Takatsuki andM. Egashira,Res. Rep. Nagasaki Univ. 19 (1989) 87.
Y. Toda andA. Kato,Ceram. Int. 15 (1989) 161.
H. Tada, K. Miyata, H. Yoshida andH. Kawarada,Shikizaki 61 (1988) 665.
S. Nguyen, D. Dobuzinsky, D. Harmon, R. Gleason andS. Fridmann,J. Electrochem. Soc. 137 (1990) 2209.
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Tsugeki, K., Yan, S., Maeda, H. et al. Silica coating of aluminium nitride particles by radio-frequency plasma chemical vapour deposition. J Mater Sci Lett 13, 43–45 (1994). https://doi.org/10.1007/BF02352915
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DOI: https://doi.org/10.1007/BF02352915