Abstract
The effect of successive applications (0 to 4) of fosetyl-Al on the growth of mycorrhizal (M) and nonmycorrhizal (NM) onion plants and on the residual quantity of the fungicide in the root was studied for 6 weeks under growth chamber conditions. Fosetyl-Al was applied as foliar spray at a concentration of 3 mg ml−1. The successive applications of fosetyl-Al did not affect the dry mass of root or shoot of M plants. NM plants sprayed only once with fosetyl-Al had a higher root mass than plants sprayed 0, 2, 3 and 4 times. The quantity of phosphorous acid, the only residue detected, was positively correlated with the number of fosetyl-Al applications. It showed a positive partial correlation coefficient with the shoot (r=0.41) and the root dry mass (r=0.40) of NM and M plants.
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Contribution no 344, Station de recherches, Agriculture Canada, Sainte-Foy.
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Despatie, S., Furlan, V. & Fortin, J.A. Effects of successive applications of fosetyl-Al on growth ofAllium cepa L. associated with endomycorrhizal fungi. Plant Soil 113, 175–180 (1989). https://doi.org/10.1007/BF02280178
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DOI: https://doi.org/10.1007/BF02280178