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Hydrogen determination by means of the1H(19F, αγ)16 O and1H(15N, αγ)12C resonance reactions

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Abstract

Hydrogen surface contamination and depth profiles can be measured by the resonant nuclear reactions1H(19F, αγ)16O and1H(15N, αγ)12C. The method was applied to study hydrogen-implanted silicon, amorphous silicon layers and silicon oxide films produced by anodic oxidation.

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Authors and Affiliations

  1. Central Institute of Nuclear Research, Rossendorf, 8051, Dresden, (GDR)

    W. Rudolph, C. Bauer, P. Gippner, D. Grambole, C. Heiser, F. Herrmann & H. -J. Thomas

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  1. W. Rudolph
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  2. C. Bauer
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  3. P. Gippner
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  4. D. Grambole
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  5. C. Heiser
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  6. F. Herrmann
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  7. H. -J. Thomas
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Rudolph, W., Bauer, C., Gippner, P. et al. Hydrogen determination by means of the1H(19F, αγ)16 O and1H(15N, αγ)12C resonance reactions. Journal of Radioanalytical and Nuclear Chemistry, Articles 83, 99–105 (1984). https://doi.org/10.1007/BF02209299

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  • DOI: https://doi.org/10.1007/BF02209299

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