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Separation of iron from semiconductor grade silicon in activation analysis

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Abstract

A method of separation of iron from silicon for use in the neutron activation analysis has been developed. Iron was separated by extraction with N-benzoyl-N-phenylhydroxylamine /HBPHA/ from 0.4N HCl solution followed by extraction at pH=3.0. The lower limit of determination was 9.9×10−9 g.

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Authors and Affiliations

  1. Institute of Nuclear Chemistry and Technology, ul. Dorodna 16, 01-195, Warszawa, Poland

    H. Jaskólska & L. Waliś

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  1. H. Jaskólska
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  2. L. Waliś
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Jaskólska, H., Waliś, L. Separation of iron from semiconductor grade silicon in activation analysis. Journal of Radioanalytical and Nuclear Chemistry Letters 145, 355–360 (1990). https://doi.org/10.1007/BF02165076

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  • DOI: https://doi.org/10.1007/BF02165076

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