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Thermal evolution and stability of a tin nitride obtained by reactive sputtering

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Abstract

Tin nitride obtained by reactive magnetron sputtering was annealed at several temperatures to study the thermal evolution and stability of the compound. X-ray diffraction, thermal effusion and conversion electron Mössbauer spectrometry were used to characterize the events. The nitride has different stabilities, depending on the ambient conditions under which the annealings are performed. Apparently only one crystallographic phase of the nitride is present before it disproportionates.

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References

  1. R.S. Lima, P.H. Dionísio, W.H. Schreiner and C. Achete, Solid State Commun. 79 (1991) 395.

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  2. O. Takai,Proc. of the SID 28/3 (1987) 243.

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Authors and Affiliations

  1. Instituto de Física da Universidade Federal do Rio Grande do Sul, CP 15051, 91501-970, Porto Alegre, RS, Brazil

    R. S. Lima, P. H. Dionísio, J. T. Moro & W. H. Schreiner

  2. Laboratório de Estudos de Materiais e Interfaces, CP 68505, 21945, Rio de Janeiro, RJ, Brazil

    C. Achete

Authors
  1. R. S. Lima
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  2. P. H. Dionísio
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  3. J. T. Moro
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  4. W. H. Schreiner
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  5. C. Achete
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Lima, R.S., Dionísio, P.H., Moro, J.T. et al. Thermal evolution and stability of a tin nitride obtained by reactive sputtering. Hyperfine Interact 83, 315–319 (1994). https://doi.org/10.1007/BF02074292

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  • DOI: https://doi.org/10.1007/BF02074292

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