Abstract
Acid-base and redox properties of TiO2/SiO2 surface go through a minimum as a function of temperature. Practical applications of this phenomenon are discussed.
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Ogenko, V.M., Fesenko, A.V., Konovalova, N.D. et al. Acid-base and redox properties of the TiO2/SiO2 surface. React Kinet Catal Lett 54, 355–359 (1995). https://doi.org/10.1007/BF02071030
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DOI: https://doi.org/10.1007/BF02071030