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Characterization of Cu−Rh/SiO2 by temperature-programmed desorption (TPD) of hydrogen

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Abstract

The presence of Cu on Rh/SiO2 inhibited H2 chemisorption at 303 K and suppressed CO hydrogenation. TPD study shows that chemisorption of H2 on Cu−Rh/SiO2 is an activated process at 303 K.

Abstract

Присутствие Cu на Rh/SiO2 ингибирует хемосорбцию H2 при 303 К и подавляет гидрирование CO. Результаты исследований ТПД свидетельствуют о том, что хемосорбция H2 на Cu−Rh/SiO2 является активированным процессом при температуре 303 К.

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Authors and Affiliations

  1. Department of Chemical Engineering, University of Akron, 44325, Akron, OH

    Steven S. C. Chuang

  2. Pittsburgh Energy Technology Center, U.S. Department of Energy, P.O. Box 10940, 15236, Pittsburhg, PA, USA

    Richard R. Schehl

Authors
  1. Steven S. C. Chuang
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  2. Yee Soong
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  3. Richard P. Noceti
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  4. Richard R. Schehl
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Chuang, S.S.C., Soong, Y., Noceti, R.P. et al. Characterization of Cu−Rh/SiO2 by temperature-programmed desorption (TPD) of hydrogen. React Kinet Catal Lett 48, 31–36 (1992). https://doi.org/10.1007/BF02070063

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  • DOI: https://doi.org/10.1007/BF02070063

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