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Dynamical behavior of muonium on silica surfaces


The behavior of muonium on the surface of finely divided silica (amorphous SiO2) powder (mean grain diameter 70 Å) has been studied as a function of the surface concentration of hydroxyl groups. The temperature dependence of the Mu relaxation rate in transverse field was measured for samples prepared with 0%, 50% and 70% of the surface hydroxyl groups removed over the temperature range 4 K <T < 300 K. The relaxation rate shows a distinct maximum at about 25 K and a minimum at about 16 K for all three samples, and shows a dramatic decrease below 16 K as the concentration of surface hydroxyls is reduced. A three-state nonequilibrium model describing the diffusion and trapping of muonium on the silica surface is used to interpret the data.

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On leave from Department of Physics, University of Saskatchewan, Saskatoon, Sask. S7N OWO, Canada.

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Harshman, D.R., Keitel, R., Senba, M. et al. Dynamical behavior of muonium on silica surfaces. Hyperfine Interact 18, 557–561 (1984).

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  • Thin Film
  • SiO2
  • Hydroxyl
  • Dynamical Behavior
  • Relaxation Rate