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Dynamical behavior of muonium on silica surfaces

Abstract

The behavior of muonium on the surface of finely divided silica (amorphous SiO2) powder (mean grain diameter 70 Å) has been studied as a function of the surface concentration of hydroxyl groups. The temperature dependence of the Mu relaxation rate in transverse field was measured for samples prepared with 0%, 50% and 70% of the surface hydroxyl groups removed over the temperature range 4 K <T < 300 K. The relaxation rate shows a distinct maximum at about 25 K and a minimum at about 16 K for all three samples, and shows a dramatic decrease below 16 K as the concentration of surface hydroxyls is reduced. A three-state nonequilibrium model describing the diffusion and trapping of muonium on the silica surface is used to interpret the data.

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On leave from Department of Physics, University of Saskatchewan, Saskatoon, Sask. S7N OWO, Canada.

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Harshman, D.R., Keitel, R., Senba, M. et al. Dynamical behavior of muonium on silica surfaces. Hyperfine Interact 18, 557–561 (1984). https://doi.org/10.1007/BF02064867

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Keywords

  • Thin Film
  • SiO2
  • Hydroxyl
  • Dynamical Behavior
  • Relaxation Rate