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Hyperfine Interactions

, Volume 18, Issue 1–4, pp 557–561 | Cite as

Dynamical behavior of muonium on silica surfaces

  • D. R. Harshman
  • R. Keitel
  • M. Senba
  • E. J. Ansaldo
  • J. H. Brewer
Muonium-Like States in Solids

Abstract

The behavior of muonium on the surface of finely divided silica (amorphous SiO2) powder (mean grain diameter 70 Å) has been studied as a function of the surface concentration of hydroxyl groups. The temperature dependence of the Mu relaxation rate in transverse field was measured for samples prepared with 0%, 50% and 70% of the surface hydroxyl groups removed over the temperature range 4 K <T < 300 K. The relaxation rate shows a distinct maximum at about 25 K and a minimum at about 16 K for all three samples, and shows a dramatic decrease below 16 K as the concentration of surface hydroxyls is reduced. A three-state nonequilibrium model describing the diffusion and trapping of muonium on the silica surface is used to interpret the data.

Keywords

Thin Film SiO2 Hydroxyl Dynamical Behavior Relaxation Rate 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© J.C. Baltzer AG, Scientific Publishing Company, and Yamada Science Foundation 1984

Authors and Affiliations

  • D. R. Harshman
    • 1
  • R. Keitel
    • 1
    • 2
  • M. Senba
    • 1
    • 3
  • E. J. Ansaldo
    • 1
  • J. H. Brewer
    • 1
  1. 1.TRIUMF and Department of PhysicsUniversity of British ColumbiaVancouverCanada
  2. 2.Department of PhysicsUniversity of Erlangen-NürnbergWest Germany
  3. 3.TRIUMF and Department of ChemistryUniversity of British ColumbiaVancouverCanada

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