Dynamical behavior of muonium on silica surfaces
- 12 Downloads
The behavior of muonium on the surface of finely divided silica (amorphous SiO2) powder (mean grain diameter 70 Å) has been studied as a function of the surface concentration of hydroxyl groups. The temperature dependence of the Mu relaxation rate in transverse field was measured for samples prepared with 0%, 50% and 70% of the surface hydroxyl groups removed over the temperature range 4 K <T < 300 K. The relaxation rate shows a distinct maximum at about 25 K and a minimum at about 16 K for all three samples, and shows a dramatic decrease below 16 K as the concentration of surface hydroxyls is reduced. A three-state nonequilibrium model describing the diffusion and trapping of muonium on the silica surface is used to interpret the data.
KeywordsThin Film SiO2 Hydroxyl Dynamical Behavior Relaxation Rate
Unable to display preview. Download preview PDF.
- G. Marshall et al., Phys. Lett.65A (1978) 351Google Scholar
- R. Kiefl et al., Phys. Rev.B26 (1982) 2432Google Scholar
- Cabot Corporation technical report, Cab-O-Sil, Properties and Functions (Cabot Corp., Boston, MA)Google Scholar
- T. McMullen and E. Zaremba, Phys. Rev.B18 (1978) 3026Google Scholar
- K.G. Petzinger, Hyperfine Interactions6 (1979) 223Google Scholar
- K.G. Petzinger, Hyperfine Interactions8 (1981) 639Google Scholar
- A.T. Fiory, Hyperfine Interactions6 (1979) 261Google Scholar
- D.R. Harshman et al., to be publishedGoogle Scholar