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Adsorption of traces of hafnium on manganese dioxide from acid solutions

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Abstract

Adsorption of hafnium on manganese dioxide from nitric and perchloric acid solutions has been studied and optimized with respect to shaking time, concentration of acid, oxide and metal. Maximum adsorption has been noticed from 0.1 mol · dm−3 acid solutions in 20 minutes around 10−5 mol · dm−3 hafnium concentration. The adsorption of hafnium follows a Freundlich adsorption isotherm. Oxalate, thiosulfate, Na(I) and Al(III) from nitric acid and K(I) and Zn(II) from perchloric acid increase the adsorption, whereas all other anions and cations tested reduce the adsorption from both media Fe(III) and Sn(IV) significantly. Zn(II) and Co(II) show low adsorption affinity.

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Authors and Affiliations

  1. Nuclear Chemistry Division, Pakistan Institute of Nuclear Science and Technology, P. O. Nilore, Islamabad, (Pakistan)

    S. M. Hasany & M. H. Chaudhary

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  1. S. M. Hasany
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  2. M. H. Chaudhary
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Hasany, S.M., Chaudhary, M.H. Adsorption of traces of hafnium on manganese dioxide from acid solutions. Journal of Radioanalytical and Nuclear Chemistry, Articles 131, 425–434 (1989). https://doi.org/10.1007/BF02060608

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  • DOI: https://doi.org/10.1007/BF02060608

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