Skip to main content
SpringerLink
Log in

Dissolution of hydrogen and nitrogen in silicon

  • Radioanalytical Application
  • Published:
Journal of Radioanalytical and Nuclear Chemistry Aims and scope Submit manuscript

Abstract

Deuterium and15N were used as activable tracers for the study of the dissolution of hydrogen and nitrogen in silicon. Silicon was heated or zone-melted in D2-Ar, or heated in15N2-Ar after being covered with Si3 25N4. Depth profiles of D or15N in the resultant silicon samples were measured by the D(3He, p)4He or15N(α, n)18F reaction combined with repeated HF−HNO3 etching. These two measurements have proved to be highly reliable and sensitive and to offer useful techniques in the study of trace concentrations of hydrogen and nitrogen in solid matrices.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. T. NOZAKI, ITOH, S. HAYASHI, Q. QIU, J. Radioanal. Chem., 112 (1987) 47

    Google Scholar 

  2. J. L. YARNELL, R. H. LOVBERG, W. R. STRATTON, Phys. Rev., 90 (1953) 292.

    Article  Google Scholar 

  3. H. H. ANDERSON, J. F. ZIEGLER, Hydrogen Stopping Power and Ranges in All Elements, Pergamon, New York, 1977.

    Google Scholar 

  4. T. NOZAKI, M. IWAMOTO, T. IDO, Int. J. Appl. Radiation Istotopes, 25 (1974) 393.

    Article  Google Scholar 

  5. Y. ITOH, T. NOZAKI, J. Radioanal. Chem., 70 (1982) 329.

    Google Scholar 

  6. P. V. PAVLOV, E. I. ZORIN, D. I. TETELBAUM, A. F. KHOKHLOV, Phys. Stat. Sol., 35 (1976) 11.

    Google Scholar 

  7. T. NOZAKI, Y. YATSURUGI, N. AKIYAMA, Y. ENDO, Y. MAKIDE, J. Radioanal. Chem., 19 (1974) 109.

    Google Scholar 

Download references

Author information

Authors and Affiliations

  1. Institute of Physical and Chemical Research, 351-01, Wako-shi, Saitama, Japan

    T. Nozaki, Y. Itoh & Q. Qiu

Authors
  1. T. Nozaki
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Y. Itoh
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Q. Qiu
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

Nozaki, T., Itoh, Y. & Qiu, Q. Dissolution of hydrogen and nitrogen in silicon. Journal of Radioanalytical and Nuclear Chemistry, Articles 124, 341–352 (1988). https://doi.org/10.1007/BF02041326

Download citation

  • Received:

  • Issue Date:

  • DOI: https://doi.org/10.1007/BF02041326

Keywords

Search

Navigation