Skip to main content
SpringerLink
Log in

Chemical vapor deposition using lanthanide β-diketone chelates with difluorodichloromethane

  • Published:
Journal of Radioanalytical and Nuclear Chemistry Aims and scope Submit manuscript

Abstract

Preparation of lanthanide fluoride and chloride films has been studied by chemical vapor deposition (CVD) using Ln(thd)3 (Ln=lanthanide(III); thd=2,2,6,6-tetramethyl-3,5-heptanedionato ligand) and Y(thd)3 with gas mixture systems of CF2Cl2 (difluorodichloromethane)/O2 and CF2Cl2/H2. Two kinds of fluorides, LnOF oxyfluoride and LnF3 triffluoride, were obtained separately along a CVD tube at atmospheric pressure and temperature as low as 300–600°C by the reaction of Ln(thd)3 chelates with CF2Cl2/O2 gas system. The chemical characteristics of the CVD products were considered from the thermochemical point of view.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. Y. SHIOKAWA, R. AAMANO, M. NOMURA, M. YAGI, J. Radioanal. Nucl. Chem., 152 (1991) 373.

    Google Scholar 

  2. R. AMANO, Y. SHIOKAWA, J. Radioanal. Nucl. Chem., 155 (1991) 201.

    Google Scholar 

  3. O. GREIS, J. M. HASCHKE, in: K. A. GSCHNEIDNER, Jr. and L. EYRING (Eds) Handbook on the Physics and Chemistry of the Rare Earth, Vol. 5. North-Holland, 1982, p. 387.

  4. J. C. SPIRLET, O. VOGT, in: A. J. FREEMAN and G. H. LANDER (eds) Handbook on the Physics and Chemistry of the Actinides, Vol. 1, Elsevier, Amsterdam, 1984, p. 79.

    Google Scholar 

  5. K. J. EISENTRAUT, R. E. SIEVERS, J. Am. Chem. Soc., 87 (1965) 5254.

    Google Scholar 

  6. M. SAKANOUE, R. AMANO, in: W. MULLER and R. LINDNER (Eds), Transplutonium 1975, North-Holland/American Elsevier, Amsterdam, 1976, p. 123.

    Google Scholar 

  7. G. PAUSEWANG, W. RUDORFF, Z. Anorg. Allg. Chem., 368 (1969) 89.

    Google Scholar 

  8. MALT personal computer program, Kagakugijyutu-Hyoronnsya, Tokyo, 1985.

Download references

Author information

Authors and Affiliations

  1. School of Allied Medical Professions, Kanazawa University, 920, Kodatsuno, Kanazawa, (Japan)

    R. Amano

  2. The Oarai Branch, Institute of Materials Research, Tohoku University, 311-13, Oarai, Ibaraki, (Japan)

    Y. Shiokawa & Y. Suzuki

  3. Institute for Advanced Materials Processing, Tohoku University, Katahira, Aoba-ku, 980, Sendai, (Japan)

    N. Sato

Authors
  1. R. Amano
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Y. Shiokawa
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. N. Sato
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. Y. Suzuki
    View author publications

    You can also search for this author in PubMed Google Scholar

Rights and permissions

Reprints and permissions

About this article

Cite this article

Amano, R., Shiokawa, Y., Sato, N. et al. Chemical vapor deposition using lanthanide β-diketone chelates with difluorodichloromethane. Journal of Radioanalytical and Nuclear Chemistry, Articles 172, 81–86 (1993). https://doi.org/10.1007/BF02040664

Download citation

  • Received:

  • Issue Date:

  • DOI: https://doi.org/10.1007/BF02040664

Keywords

Search

Navigation