Advertisement

Journal of Materials Science Letters

, Volume 6, Issue 4, pp 437–438 | Cite as

Ion-beam sputtering apparatus with a simplified accelerator system for deposition of thin films

  • T. Suzuki
  • T. Yamazaki
  • H. Yoshioka
  • K. Takahashi
  • T. Kageyama
Article

Keywords

Polymer Thin Film Accelerator System 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

References

  1. 1.
    H. R. KAUFMAN,Adv. Electron. Electron Phys. 36 (1974) 265.Google Scholar
  2. 2.
    J. M. E. HARPER, “Thin Film Processes” (Academic, New York, 1978) p. 175.Google Scholar
  3. 3.
    R. S. ROBINSON,J. Vac. Sci. Technol. 15 (1978) 277.Google Scholar
  4. 4.
    H. R. KAUFMAN, J. M. E. HARPER and J. J. CUOMO,ibid. 16 (1979) 899.Google Scholar
  5. 5.
    M. NAOE, N. TERADA, Y. HOSHI and S. YAMANAKA,IEEE Trans. Magn. MAG-20 (1984) 1311.Google Scholar
  6. 6.
    H. R. KAUFMAN, P. D. READER and G. C. ISAACSON,AIAA J. 15 (1977) 843.Google Scholar
  7. 7.
    J. F. WASSERBAUER, NASA TN D-3628 (1966).Google Scholar

Copyright information

© Chapman and Hall Ltd. 1987

Authors and Affiliations

  • T. Suzuki
    • 1
  • T. Yamazaki
    • 1
  • H. Yoshioka
    • 1
  • K. Takahashi
    • 1
  • T. Kageyama
    • 1
  1. 1.Department of Industrial Chemistry, Faculty of TechnologyTokyo University of Agriculture and TechnologyKoganeishi, TokyoJapan

Personalised recommendations