Independent UHF plasma source and possibility of filling open magnetic trap

Abstract

A stationary UHF plasma source, its characteristics and possibility of filling open magnetic trap with plasma injected from it have been described. Plasma is created in the source at frequency of 2400 MHz (supplied power is up to 150 W) in the electron cyclotron resonance (ECR) regime under working gas pressure 10⁻⁵–10⁻² Torr. By changing discharge conditions one can change the injected plasma density from 10⁹ to 10¹² cm⁻³, at the temperatureT _e=2–10 eV. The possibility of efficient plasma injection from the source into the open magnetic trap of various configurations is shown experimentally. Plasma characteristics in the trap are presented under various experimental conditions. It is established that plasma parameters can be easily changed in the trap.