Journal of Materials Science Letters

, Volume 5, Issue 10, pp 1061–1062 | Cite as

Application of a glow discharge ion gun to sputtering yield measurements

  • Zbigniew W. Kowalski
Article
  • 12 Downloads

Keywords

Polymer Glow Discharge Yield Measurement Sputter Yield Measurement 

References

  1. 1.
    H. H. ANDERSEN and H. L. BAY, in “Topics in Applied Physics”, Vol. 1, edited by R. Behrish (Springer, Berlin, 1981) pp. 145–218.Google Scholar
  2. 2.
    H. E. ROOSENDALL,ibid. pp. 219–256.Google Scholar
  3. 3.
    G. BETZ and G. K. WEHNER,ibid., Vol. 2, edited by R. Behrish (Springer, Berlin, 1983).Google Scholar
  4. 4.
    P. SIGMUND,ibid., Vol. 1, edited by R. Behrish (Springer, Berlin, 1981) pp. 9–71.Google Scholar
  5. 5.
    A. HEUER, R. F. FIRESTONE, J. D. SNOW, H. W. GREEN and R. G. HOWE,Rev. Sci. Instrum. 42 (1971) 1177.Google Scholar
  6. 6.
    C. G. CROCKETT,Vacuum 23 (1972) 11.Google Scholar
  7. 7.
    Z. W. KOWALSKI,J. Mater. Sci. 16 (1981) 3512.Google Scholar
  8. 8.
    Idem, ibid. 17 (1982) 1627.Google Scholar
  9. 9.
    L. HOLLAND, W. STECKELMACHER and J. YARDWOOD (eds) “Vacuum Manual” (Spon, London, 1974) p. 370.Google Scholar
  10. 10.
    Z. W. KOWALSKI,J. Mater. Sci. 20 (1985) 1521.Google Scholar

Copyright information

© Chapman and Hall Ltd 1986

Authors and Affiliations

  • Zbigniew W. Kowalski
    • 1
  1. 1.Technical University of WrocławWrocławPoland

Personalised recommendations