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Hybridization between Si3N4 and SiC films by plasma CVD

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Technological University of Nagaoka, 949-54, Nagaoka, Niigata, Japan

    Kiichiro Kamata & Yuuji Maeda

  2. Nagano College of Technology, 380, Nagano, Japan

    Minoru Moriyama

Authors
  1. Kiichiro Kamata
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  2. Yuuji Maeda
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  3. Minoru Moriyama
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Kamata, K., Maeda, Y. & Moriyama, M. Hybridization between Si3N4 and SiC films by plasma CVD. J Mater Sci Lett 5, 1051–1054 (1986). https://doi.org/10.1007/BF01730280

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  • DOI: https://doi.org/10.1007/BF01730280

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