References
R. P. H. CHANG and S. DARACK,Appl. Phys. Lett. 38 (1981) 898.
R. P. H. CHANG, C. C. CHANG and S. DARACK,J. Vac. Sci. Technol. 20 (1982) 45.
R. D. FELDMAN, R. L. OPILA and P. M. BRIDENBAUGH,ibid. A3 (1985) 1988.
J. CHEVALLIER, W. C. DAUTREMONT-SMITH, S. J. PEARTON and C. W. TU, Proceedings of the 3rd International Symposium on dry etching and plasma deposition in microelectronics (Société Française du Vide, Cachan, France, 1985) p. 161.
A. JALIL, J. CHEVALLIER, R. AZOULAY and A. MIRCEA,J. Appl. Phys. to be published.
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Svob, L., Chevallier, J., Ossart, P. et al. Hydrogen plasma etching of CdTe. J Mater Sci Lett 5, 1319–1320 (1986). https://doi.org/10.1007/BF01729405
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DOI: https://doi.org/10.1007/BF01729405