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Evidence for localizing properties of XPS applied to valence bands

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Zeitschrift für Physik

Abstract

X-ray photoelectron spectroscopy (XPS)-measurements of the valence bands of Cu, Ag and Au have been performed and their integrated intensities have been compared. A model calculation which considers the influence of the x-ray absorption length as well as the electronic escape depth on the obtained intensities was established and applied to the measurements. An additional electron microscopic study on the surface structure of the evaporated samples has been performed. Its influence on the obtained photoelectron yield is discussed. The results support a marked dependence of the integrated valence band intensity on the atomic number. The implications for the interpretation of XPS valence band spectra of alloys are discussed and compared with corresponding x-ray isochromat spectroscopy (XIS)-measurements. Furthermore we deal with the important question whether XPS-as well as XIS-spectra can be described mainly in terms of the electronic band structure or whether atomic features are also present, though both methods are free from participation of core levels. The results are discussed in terms of localizing properties of XPS.

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We wish to thank Dr. L. Albert and his group for performing of the electron microscopic studies at his laboratory in the Physikalisches Institut der Universität Karlsruhe. One of us (J. K.) wishes to thank Prof. K. Ulmer for stimulating this work and for valuable discussions.

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Kieser, J., Trogus, H. Evidence for localizing properties of XPS applied to valence bands. Z. Physik 267, 9–13 (1974). https://doi.org/10.1007/BF01680355

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