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Surface segregation of impurities, manganese and silicon, on hydrogen-annealed 36% Ni—Fe alloy

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Materials Application Department, Toshiba Research and Development Centre, Toshiba Corporation, 1-Komukai-Toshiba-cho, Saiwai-ku, Kawasaki-shi, Kanagawa-ken, Japan

    Michihiko Inaba, Masashi Awa, Eiichi Akiyoshi & Yasuhisa Otake

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  1. Michihiko Inaba
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  2. Masashi Awa
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  3. Eiichi Akiyoshi
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  4. Yasuhisa Otake
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Inaba, M., Awa, M., Akiyoshi, E. et al. Surface segregation of impurities, manganese and silicon, on hydrogen-annealed 36% Ni—Fe alloy. J Mater Sci Lett 5, 16–18 (1986). https://doi.org/10.1007/BF01671420

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  • DOI: https://doi.org/10.1007/BF01671420

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