Abstract
Magnetron discharge during Ti sputtering was examined by Langmuir probe. Electron densities and energies were determined at different Ar pressures, dc. powers and distances from magnetron target. Values in order of 1015m−3 and 1eV were measured even at distances up to 15 cm.
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References
Musil, J. et al.: “Experimental measurements of basic physical dependences during the creation of thin TiN layers by the planar magnetron”; internal rept. No 2/83, ÚFP ČSAV, Inst. of Plasma Phys., Czech. Acad. Sci., Prague (1983), (in Czech).
Libra, M., Bárdoš, L., Musil, J.: “Adaptation of the evaporation apparatus PP 601 into the magnetron deposition system”; internal rept. No 026/86, FzU-86-5, Institute of Physios, Czech. Acad. Sci., Prague (1986), (in Czech).
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The authors are grateful to Ing. J. Musil, DrSc. and Ing. A. Šprachta, CSc. for supporting this work. Helpful discussion with RNDr. S. Kadlec are also gratefully acknowledged.
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Bárdoš, L., Libra, M. & Krusteva, A.P. Probe diagnostics op the planar magnetron discharge. Czech J Phys 36, 883–886 (1986). https://doi.org/10.1007/BF01598339
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DOI: https://doi.org/10.1007/BF01598339