Abstract
The electrical resistivity of thin nickel films, thermally evaporated on freshly cleaved mica and smooth glass at 160 °C is studied. The measurements were taken in situ before and after annealing at 420 °C.
The values of resistivity of thinner films are reduced by few orders of magnitude after annealing. A sharp reduction in the resistivity is noticed for films prepared on mica compared with those prepared on glass under the same conditions. The resistivity of films with thickness less than 200 Å on glass is irreversible with reduction, while on mica it is reversible. A tunnelling mechanism in the absence of Fuchs theory is adapted to explain the abrupt increase in resistivity of the island-films. The data recorded for thicker films was fitted to Fuchs theory withp=0.
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The authors would like to acknowledge Prof. Dr. K. R.Wassif for his kind cooperation and interest.
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Eid, A.H., Mahmoud, S., Elmanharawy, M.S. et al. Size-dependent electrical conduction of thin nickel films. Czech J Phys 29, 451–459 (1979). https://doi.org/10.1007/BF01596555
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DOI: https://doi.org/10.1007/BF01596555