Conclusion
Aluminium nitride is the very promising thin film material for piezoelectric /2,3/ and microelectronic /4,5/ applications. The high microhardness of AlNX films, verified in our experiment, opens new possibilities of practical utilization of these films.
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We wish to thank O.Pártl of the Department of Materials of the Faculty of Nuclear Science and Physical Engineering in Prague for help with microhardness measurements.
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Švub, J., Musil, J. ALNx thin films produced by d.c. reactive magnetron sputtering. Czech J Phys 35, 1191–1192 (1985). https://doi.org/10.1007/BF01596435
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DOI: https://doi.org/10.1007/BF01596435