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The authors wish to thank Dr. P. Taras of the Institute of Plasma Physics of the Czechoslovak Academy of Sciences for helpfull discussions.
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Bŕdoš, L., Musil, J. & Lubański, M. Chemiluminescence of the silane — Active nitrogen reactions during PECVD of the silicon nitride films. Czech J Phys 34, 1242–1245 (1984). https://doi.org/10.1007/BF01590071
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DOI: https://doi.org/10.1007/BF01590071