Abstract
The paper concerns the possibility of using CW (continuous wave) CO2-laser annealing (λ=10.6 μm,P≤ 100 W/cm2) for formation of a barrier in the Al/a-Si:H/SS (SS-stainless steel) structures with good rectifyingI–V characteristics. The infrared absorption spectra, photoelectric properties, temperature effect on the conductivity and saturation current were analyzed and various contact models are discussed.
Similar content being viewed by others
References
Madan A.:in The Physics of Hydrogenated Amorphous Silicon I (Eds. J. D. Joannopoulos, G. Lucovsky). Springer-Verlag, Berlin, 1984, p. 310.
Carlson D., Wronski C.:in Amorphous Semiconductors (Ed. M. H. Brodsky). Springer-Verlag, Berlin, 1979.
Chen I., Lee S.: J. Appl. Phys.53 (1982) 1045.
Sachenko A. V.: Fiz. Tekh. Polupr.17 (1983) 1782.
Il'chenko V. V., Strikha V. I.: Fiz. Tekh. Polupr.18 (1984) 873.
Krishna K. V., Guha S., Narasimhan K. L.: Solar Cells4 (1981) 5.
Bertolloti M., Ferrari A., Evangelisti F., Fiorini P., Prioetti M. G.: Zentrallinstitut für Kernforschung, Rossendorf bei Dresden555 (1985) 351.
Bertolotti M., Ferrari A., Evangelisti F., Fiorini P.: J. Non-Cryst. Solids90 (1987) 167.
Grosse P., Harbecke B., Heinz B., Meyer R.: Appl. Phys. A39 (1986) 257.
Hong C. S., Huang H. L.: J. Appl. Phys.61 (1987) 4593.
Xu X., Morimoto A., Kumeda M., Shimizu T.: Jpn. J. Appl. Phys.26 (1986) 661.
Vorobyov Yu. V., Kil'chitskaya S. S., Komirenko R. P., Litvinenko S. V., Skryshevsky V. A., Strikha V. L.: Fiz. Tekh. Polupr.20 (1986) 661.
Carlson D. E., Magee C. W.: App. Phys. Lett.33 (1978) 81.
Staebler D. L., Wronski C. R.: J. Appl. Phys.51 (1980) 3262.
Sabisky E. S.: J. Non-Cryst. Solids87 (1986) 43.
Adler D., Eberhart M., Johnson K., Zygmut S.: J. Non-Cryst. Solids66 (1984) 273.
Tawada Y., Nishimura K., Nonomura S., Okamoto H., Hamakawa Y.: Solar Cells9 (1983) 53.
Iwata S.: J. Jpn. Metals41 (1981) 5.
Fang P. H.: Solar Cells25 (1988) 27.
Strikha V. I.: The Contact Phenomena in Semiconductors. Kiev, 1982.
Fang P. H., Bai P., Schubert C. C., Kinnier J. H.: J. Non-Cryst. Solids59/60 (1983) 819.
Author information
Authors and Affiliations
Additional information
We thank P. Čičmanec for useful and stimulating discussion, J. Stuchlík for kindly manufacturing the a-Si:H films for us and D. N. Goncharov for the aid with the measurement of the conductivity temperature dependences.
Rights and permissions
About this article
Cite this article
Glesková, H., Il'chenko, V.V., Skryshevsky, V.A. et al. CO2-laser annealing of Al/a-Si:H contact. Czech J Phys 43, 169–178 (1993). https://doi.org/10.1007/BF01589639
Received:
Revised:
Issue Date:
DOI: https://doi.org/10.1007/BF01589639