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CO2-laser annealing of Al/a-Si:H contact

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Czechoslovak Journal of Physics Aims and scope

Abstract

The paper concerns the possibility of using CW (continuous wave) CO2-laser annealing (λ=10.6 μm,P≤ 100 W/cm2) for formation of a barrier in the Al/a-Si:H/SS (SS-stainless steel) structures with good rectifyingI–V characteristics. The infrared absorption spectra, photoelectric properties, temperature effect on the conductivity and saturation current were analyzed and various contact models are discussed.

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References

  1. Madan A.:in The Physics of Hydrogenated Amorphous Silicon I (Eds. J. D. Joannopoulos, G. Lucovsky). Springer-Verlag, Berlin, 1984, p. 310.

    Google Scholar 

  2. Carlson D., Wronski C.:in Amorphous Semiconductors (Ed. M. H. Brodsky). Springer-Verlag, Berlin, 1979.

    Google Scholar 

  3. Chen I., Lee S.: J. Appl. Phys.53 (1982) 1045.

    Google Scholar 

  4. Sachenko A. V.: Fiz. Tekh. Polupr.17 (1983) 1782.

    Google Scholar 

  5. Il'chenko V. V., Strikha V. I.: Fiz. Tekh. Polupr.18 (1984) 873.

    Google Scholar 

  6. Krishna K. V., Guha S., Narasimhan K. L.: Solar Cells4 (1981) 5.

    Google Scholar 

  7. Bertolloti M., Ferrari A., Evangelisti F., Fiorini P., Prioetti M. G.: Zentrallinstitut für Kernforschung, Rossendorf bei Dresden555 (1985) 351.

    Google Scholar 

  8. Bertolotti M., Ferrari A., Evangelisti F., Fiorini P.: J. Non-Cryst. Solids90 (1987) 167.

    Google Scholar 

  9. Grosse P., Harbecke B., Heinz B., Meyer R.: Appl. Phys. A39 (1986) 257.

    Google Scholar 

  10. Hong C. S., Huang H. L.: J. Appl. Phys.61 (1987) 4593.

    Google Scholar 

  11. Xu X., Morimoto A., Kumeda M., Shimizu T.: Jpn. J. Appl. Phys.26 (1986) 661.

    Google Scholar 

  12. Vorobyov Yu. V., Kil'chitskaya S. S., Komirenko R. P., Litvinenko S. V., Skryshevsky V. A., Strikha V. L.: Fiz. Tekh. Polupr.20 (1986) 661.

    Google Scholar 

  13. Carlson D. E., Magee C. W.: App. Phys. Lett.33 (1978) 81.

    Google Scholar 

  14. Staebler D. L., Wronski C. R.: J. Appl. Phys.51 (1980) 3262.

    Google Scholar 

  15. Sabisky E. S.: J. Non-Cryst. Solids87 (1986) 43.

    Google Scholar 

  16. Adler D., Eberhart M., Johnson K., Zygmut S.: J. Non-Cryst. Solids66 (1984) 273.

    Google Scholar 

  17. Tawada Y., Nishimura K., Nonomura S., Okamoto H., Hamakawa Y.: Solar Cells9 (1983) 53.

    Google Scholar 

  18. Iwata S.: J. Jpn. Metals41 (1981) 5.

    Google Scholar 

  19. Fang P. H.: Solar Cells25 (1988) 27.

    Google Scholar 

  20. Strikha V. I.: The Contact Phenomena in Semiconductors. Kiev, 1982.

  21. Fang P. H., Bai P., Schubert C. C., Kinnier J. H.: J. Non-Cryst. Solids59/60 (1983) 819.

    Google Scholar 

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We thank P. Čičmanec for useful and stimulating discussion, J. Stuchlík for kindly manufacturing the a-Si:H films for us and D. N. Goncharov for the aid with the measurement of the conductivity temperature dependences.

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Glesková, H., Il'chenko, V.V., Skryshevsky, V.A. et al. CO2-laser annealing of Al/a-Si:H contact. Czech J Phys 43, 169–178 (1993). https://doi.org/10.1007/BF01589639

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  • DOI: https://doi.org/10.1007/BF01589639

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