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Effects of annealing on the electrical resistance of nonequilibrium thin copper films

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Czechoslovak Journal of Physics B Aims and scope

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References

  1. Vassilev P.G., Phys.Lett. 51A (1975), 391.

    Google Scholar 

  2. Monch W., Sander W., Z.Physik 157 (1959), 149.

    Google Scholar 

  3. Feldkeller E., Z.Physik 157 (1959), 65.

    Google Scholar 

  4. Cleveland J., J.Low Temp.Phys. 18 (1975), 467.

    Google Scholar 

  5. Rhobins J.L., Rhodin T.N., Surf.Sci. 2 (1964), 346.

    Google Scholar 

  6. Kaishew R., Mutaftchiew, Elektrochim.Acta 10 (1965), 643.

    Google Scholar 

  7. Maissel L.I., in Handbook of Thin Film Technology (Ed. L. Maissel and R.Glang), McGraw Hill, New York 1970, p. 13–30.

    Google Scholar 

  8. Hill R.M., Thin Solid Films 12 (1972), 367.

    Google Scholar 

  9. Kouliupin, Phys.Phenomena in Dispersed Metal Films (Ed.by Inst. of Metals), Kiew (USSR) 1971.

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Authors and Affiliations

  1. Faculty of Physics, University of Sofia, 1126, Sofia, Bulgaria

    P. G. Vassilev

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  1. P. G. Vassilev
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Vassilev, P.G. Effects of annealing on the electrical resistance of nonequilibrium thin copper films. Czech J Phys 26, 721–724 (1976). https://doi.org/10.1007/BF01589603

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  • DOI: https://doi.org/10.1007/BF01589603

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