Abstract
Bismuth films with different thicknesses have been grown by do sputtering on substrates held at room temperature. The films are always formed by columnar crystals with a grain size comparable to the film thickness which lead to surface roughness. It increases with the thickness of the films and has a strong influence on the film optical properties. The films have been irradiated with nanosecond laser pulses, and real-time reflectivity measurements during the irradiation were used to follow the changes in the film optical properties. It will be shown that pulsed-laser irradiation of films thinner than 100 nm improves substantially their surface roughness and their crystalline quality by increasing the grain size at least one order of magnitude.
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References
Y. Liu, K.A. Mcgreer, B. Nease, D.B. Haviland, G. Martinez, J.W. Halley, A.M. Geldman: Phys. Rev. Lett.67, 2068 (1991)
N. Garcia, Y.K. Kao, M. Strongin: Phys. Rev. B5, 2029 (1988)
E.R. Youngdale, J.R. Meyer, C.A. Hoffman, F.J. Bartoli, D.L. Partin, C.M. Trush, J.P. Heremans: Appl. Phys. Lett.57, 336 (1990)
C.A. Hoffmann, J.R. Meyer, F. Bartoli, A. Di Venere, X.J. Yi, C.L. Hou, H.C. Wang, J.B. Ketterson, G.K. Wong: Phys. Rev. B48, 11431 (1993)
S. Nahm, L. Salamanca-Riba, D.L. Partin, J. Heremans: J. Mater. Res.5, 784 (1990)
A.A. Ramadan, A.M. EI-Shabiny, N.Z. El-Sayed: Thin Solid Films209, 32 (1992)
A. Kumar, O.P. Katyal: J. Mater. Sci.1, 51 (1990)
C. Tellier: J. Mater. Sci.20, 1901 (1985)
Chr. Kunze: Solid State Commun.87, 359 (1993)
J. Jing, P.N. Henriksen, H.T. Chu, H. Wang: Appl. Surf. Sci.62, 105 (1992)
D.L. Partin, J. Heremans, D.T. Morelli, C.M. Thrush, C.H. Olk, T.A. Perry: Phys. Rev. B38, 3818 (1991)
H.T. Chu, P.N. Henriksen, J. Jing; H. Wang, X. Xu: Phys. Rev. B45, 11223 (1992)
D. Hesket, F. Mcllroy, D.M. Swanson, A.B. McLean, N.J. Dinardo, H. Munekata, R. Ludeke: J. Vac. Sci. Technol. B10, 1949 (1992)
A.B. Bowler, J.C. Hermanson, J.P. Lafemina, C.B. Duke: J. Vac. Sci. Technol. B10, 1953 (1992)
H.W. Bergmann, E. Schubert, K.T. Schmatjko, J. Dembowsky: Thin Solid Films174, 33 (1989)
P.G. Carey, B.J. Woratschek, F. Bachmann: Appl. Phys. Lett.57, 1499 (1989)
J. Solis, C.N. Afonso: J. Appl. Phys.69, 2105 (1991)
R. Serna, J. Solis, C.N. Afonso: J. Appl. Phys.73, 3099 (1993)
F. Vega, R. Serna, J. Solis, C.N. Afonso: Appl. Phys. A58, 417 (1994)
J.A. Sell, D.M. Heffelfinger, P. Ventzek, R.M. Giggenbach: Appl. Phys. Lett.55, 3435 (1989)
W. Marine, J.M. Scotto D'Aniello, J. Marfaiing: Appl. Surf. Sci.46, 239 (1990)
J. Solis, C.N. Afonso: J. App1. Phys.69, 2105 (1991)
G.E. Jellison, D.H. Lowndes: Appl. Phys. Lett.51, 325 (1987)
L. Tang, G. Thomas: J. Appl. Phys.74, 5025 (1993)
L. Reimer:Transmission Electron Microscopy, 3rd edn., Springer Ser. Opt. Sci., Vol. 36 (Springer, Berlin, Heidelberg 1993)
R. Atkinson, P.H. Lissberger: Thin Solid Films17, 207 (1973)
D. Bhattacharayya, S. Chaudhuri, A.K. Pal, S.K. Bhattacharya: Vacuum43, 1201 (1992)
J.C. De Sande, T. Missana, C.N. Afonso: J. Appl. Phys. (submitted)