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Polymer photoablation under windowless VUV hydrogen or helium discharge lamp

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Abstract

In this work, the photoablation of PolyPhenyl-Quinoxaline (PPQ) films is investigated by using the vacuum ultraviolet (VUV) incoherent emission (λ<160nm) from a novel windowless hydrogen (or helium) discharge lamp. A tentative explanation of the film etching process is given through the photochemical reactions which take place in the polymer under VUV illumination.

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Authors and Affiliations

  1. Laboratoire PHASE (UPR 292), CNRS, B.P.20, F-67037, Strasbourg Cedex 2, France

    C. Fuchs, O. Goetzberger, R. Henck & E. Fogarassy

Authors
  1. C. Fuchs
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  2. O. Goetzberger
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  3. R. Henck
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  4. E. Fogarassy
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Fuchs, C., Goetzberger, O., Henck, R. et al. Polymer photoablation under windowless VUV hydrogen or helium discharge lamp. Appl. Phys. A 60, 505–507 (1995). https://doi.org/10.1007/BF01538776

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  • DOI: https://doi.org/10.1007/BF01538776

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