Abstract
We report thermal diffusivity measurements of thin Niobium films on glass substrates, using OptoThermal Transient Emission Radiometry (OTTER). The result is a thermal diffusivity value ofD=(2.79±0.36)×10−5 m2/s, which is within 17% of the accepted value for multicrystaline bulk niobium. The technique is remote sensing, non-destructive, and the measurements depend only on the thickness of the film and the thermal properties of the substrate.
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