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Laser-induced ablation of polymers using a patterned dopant generated from a leuco-dye precursor via flood exposure: A “portable conformable mask” approach to laser ablation of PMMA at 351 nm

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Abstract

A two-stage laser ablation process is described, which initially generates a laser-light absorbing image from a conventional photolithographic mask via a UV-flood exposure step. For this purpose a colorless precursor of a dye, i.e., itsleuco form, is imbedded into the polymer to be ablated as a dopant. For poly(methyl methacrylate) as such a polymer, triphenylmethanol, the leuco precursor for the corresponding triphenylmethyl dye represents a good choice for ablation with excimer lasers operating at the wavelength 351 nm. In this fashion conventional masks and exposure tools of UV-photolithography may be used in combination with laser ablation. The resulting images are characterized by a good contrast and reasonably sharp contours. The photochemical mechanism and additional aspects of this two-step process, which resembles the “portable conformal mask” approach of photolithography, are outlined.

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  1. S. Holtz

    Present address: c/o Blücher GmbH, P. O. Box 1562, D-40675, Erkrath, Germany

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  1. Institute of Physical and Theoretical Chemistry, University of Bonn, Wegelerstrasse 12, D-53115, Bonn, Germany

    S. Holtz & J. Bargon

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Holtz, S., Bargon, J. Laser-induced ablation of polymers using a patterned dopant generated from a leuco-dye precursor via flood exposure: A “portable conformable mask” approach to laser ablation of PMMA at 351 nm. Appl. Phys. A 60, 529–535 (1995). https://doi.org/10.1007/BF01538524

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  • DOI: https://doi.org/10.1007/BF01538524

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