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Femtosecond transient reflection from polymer surfaces during femtosecond UV photoablation

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Abstract

A subpicosecond KrF laser system (248 nm, 0.5 ps) was used as a light source for ablation of PMMA Mylar and Kapton. The time-dependent reflectivity of the light-induced plasma mirror as measured by 496 nm, 0.5 ps long probe pulses showed an increase of up to 94% with 0.4–1 ps rise time and 10–15 ps fall time. The highdensity plasma mirror shows perfect optical quality, and seems to be a promising light-controlled ultrafast switch for UV and visible light. The spectrum of the UV light reflected from the ablated spot is blue shifted by 0.5 nm and shows 1 nm broadening.

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Authors and Affiliations

  1. Department of Optics and Quantum Electronics, JATE University, Dóm tér 9, H-6720, Szeged, Hungary

    Z. Bor, B. Racz & G. Szabo

  2. Laser and Applications Division, Institute of Electronic Structure and Laser, GR-Heraklion 711 10, P.O. Box 1527, Crete, Greece

    D. Xenakis, C. Kalpouzos & C. Fotakis

Authors
  1. Z. Bor
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  2. B. Racz
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  3. G. Szabo
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  4. D. Xenakis
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  5. C. Kalpouzos
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  6. C. Fotakis
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Bor, Z., Racz, B., Szabo, G. et al. Femtosecond transient reflection from polymer surfaces during femtosecond UV photoablation. Appl. Phys. A 60, 365–368 (1995). https://doi.org/10.1007/BF01538335

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  • DOI: https://doi.org/10.1007/BF01538335

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