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Estimation of the capabilities of maskless micropatterning by laser-induced chemical etching

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Abstract

A three-dimensional mathematical model of laser-induced chemical etching of polysilicon films in chlorine atmosphere is presented. The model takes into account both photochemical and thermochemical mechanisms. A numerical solution of a simple process model and consequences for spatial resolution limits of the mask-less laser-induced chemical etching are presented.

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References

  1. D.J. Ehrlich, J.Y. Tsao, J. Vac. Sci. Technol. B1, 969 (1983)

    Google Scholar 

  2. D.J. Ehrlich, R.M. Osgood Jr., T.F. Deutsch: Appl. Phys. Lett.38, 1018 (1981)

    Google Scholar 

  3. M. Sekine, H. Okano, K. Yamabe, N. Hayasaka, Y. Horiike: Jpn. J. Appl. Phys.25, 1111 (1986)

    Google Scholar 

  4. G.L. Loper, M.D. Tabat: J. Appl. Phys.58, 3649 (1985)

    Google Scholar 

  5. Y. Horiike, N. Hayasaka, M. Sekine, T. Arikado, M. Nakase, H. Okano: Appl. Phys. A44, 313 (1987)

    Google Scholar 

  6. G.V. Treyz, R. Beach, R.M. Osgood Jr.: J. Vac. Sci. Technol. B6, 37 (1988)

    Google Scholar 

  7. I.P. Sytov: Appl. Phys. A55, 372 (1992)

    Google Scholar 

  8. P. Mogyorosi, K. Piglmayer, R. Kullmer, D. Bäuerle: Appl. Phys. A45, 293 (1988)

    Google Scholar 

  9. R. Kullmer, D. Bäuerle: Appl. Phys. A47, 377 (1988)

    Google Scholar 

  10. P.K. Larsen, N.V. Smith, M. Schluter, H.H. Farrell, K.N. Ho, M.L. Cohen, Phys. Rev. B17, 2612 (1978)

    Google Scholar 

  11. S. De Unamuno, E. Fogarassy: Appl. Surf. Sci.36, 1 (1989)

    Google Scholar 

  12. H. Okabe,Photochemistry of Small Molecules (Wiley, New York 1978)

    Google Scholar 

  13. H. Eyring, S.H. Lin, S.M. Lin:Basic Chemical Kinetics (Wiley, New York 1980)

    Google Scholar 

  14. R. Kullmer, D. Bäuerle: Appl. Phys. A43, 227 (1987)

    Google Scholar 

  15. O. Brioda, A. Persky: Chem. Phys.133, 405 (1989)

    Google Scholar 

  16. D. Bäuerle:Chemical Processing with Lasers, Springer Ser. Mater. Sci., Vol. 1 (Springer, Berlin, Heidelberg 1986)

    Google Scholar 

Download references

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Authors and Affiliations

  1. Department of Microelectronics, Minsk Radioengineering Institute, P. Brovki 6, 220600, Minsk, Republic of Belarus

    I. P. Sytov

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  1. I. P. Sytov
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Sytov, I.P. Estimation of the capabilities of maskless micropatterning by laser-induced chemical etching. Appl. Phys. A 61, 75–80 (1995). https://doi.org/10.1007/BF01538215

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  • DOI: https://doi.org/10.1007/BF01538215

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