Die ZerstÄubung von Kupfer durch Edelgas-Ionen im Energiebereich von 100 keV bis 1 MeV als Funktion des Einfallswinkels

Abstract

Using a 1.3MeV Van de Graaff-accelerator the sputtering ratioS of polycristalline copper bombarded by Ne⁺-, Ar⁺-, Kr⁺- and Xe⁺-ions was measured as a function of the angle of incidence in the range from 0‡ to 45‡. The ion-energy was varied from 100 keV to 1 MeV. The sputtering ratio was found to increase with bombarding angle asS=S(0‡)· (2- cos α)/cos α for Ne⁺-, Ar⁺- and Kr⁺-ions and asS=S(0‡)/cos^3/2 α for Xe⁺-ions. The increase of the sputtering ratio was found to be independent of the ion-energy.