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Ion implantation as a tool for studying the Kondo-systemZnMn

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Zeitschrift für Physik B Condensed Matter

Abstract

In the case ofZnMn alloys it is shown how low temperature ion implantation can be used for the production of dilute magnetic alloys. The Kondo effect in the resistivity ρ(T) was studied between 1.1K and 20 K. The phonon part of the resistivity was subtracted using ρ(T)-curves from Zn-Films with similar disorder produced by self-ion implantation. A logT-dependence with a slope proportional to the Mn-concentration was found below 200 ppm. The influence of disorder on the specific Kondo slope is discussed.

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Authors and Affiliations

  1. Physikalisches Institut der Universität Karlsruhe, Engesserstraße 7, D-7500, Karlsruhe, Federal Republic of Germany

    W. Bauriedl & P. Ziemann

  2. Institut für Sozial- und Arbeitsmedizin der Universität Heidelberg, Im Neuenheimer Feld 368, D-6900, Heidelberg, Federal Republic of Germany

    G. Heim

Authors
  1. W. Bauriedl
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  2. P. Ziemann
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  3. G. Heim
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Additional information

Dedicated to Prof. Dr. W. Buckel on the occasion of his 60th birthday.

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Bauriedl, W., Ziemann, P. & Heim, G. Ion implantation as a tool for studying the Kondo-systemZnMn. Z. Physik B - Condensed Matter 38, 59–63 (1980). https://doi.org/10.1007/BF01321203

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  • DOI: https://doi.org/10.1007/BF01321203

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