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Spin polarized photoemission from molecular beam epitaxy-grown be-doped GaAs

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Zeitschrift für Physik B Condensed Matter

Abstract

We have made a comparative study of the performance of spin polarized photocathodes based on molecular beam epitaxy (MBE) grown GaAs with Be-doping and on liquid phase epitaxy (LPE) grown GaAs with Zn-doping. The experiments were performed on GaAs (100), (110), and (111) surfaces atT-300 K. The photoelectron spin polarization (P) of the MBE-photocathodes is face dependent reaching 49% for the (111) surface, a value close to P=50% predicted by theory. In contrast for the LPE-photocathodes P is significantly lower (19≲P≲36%). Possible causes for the higher polarization of the MBE-photocathodes are investigated. The influence of the Zn- and Be-dopant is elucidated by theoretical model calculations which shows that replacing the Zn-dopant by Be reduces significantly the depolarization at very low temperatures, but not at room temperature. It is therefore concluded that theinterface region between the GaAs substrate and the MBE-GaAs layer grown on top of it strongly influences the performance of the source.

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On leave from the Istituto di Fisica Universitá di Modena I-41100 Modena Italy.

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Alvarado, S.F., Ciccacci, F., Valeri, S. et al. Spin polarized photoemission from molecular beam epitaxy-grown be-doped GaAs. Z. Physik B - Condensed Matter 44, 259–264 (1981). https://doi.org/10.1007/BF01294161

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  • DOI: https://doi.org/10.1007/BF01294161

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