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On the applicability of the sharp interface model in modelling the kinetics of the direct nitridation of silicon

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Journal of Materials Science Letters

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Author notes

  1. Z. R. Jovanovic

    Present address: Ceramics & Advanced Materials, The Dow Chemical Company, 52 Building, 48667, Midland, MI, USA

Authors and Affiliations

  1. Department of Chemical Engineering, Oregon State University, 97331, Corvallis, OR, USA

    Z. R. Jovanovic

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  1. Z. R. Jovanovic
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Jovanovic, Z.R. On the applicability of the sharp interface model in modelling the kinetics of the direct nitridation of silicon. J Mater Sci Lett 14, 1263–1267 (1995). https://doi.org/10.1007/BF01262262

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  • DOI: https://doi.org/10.1007/BF01262262

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