Abstract
The wear resistance of homogeneous and multilayer TiNx., TiCxNy- and TiCx-coatings is considerably determined by the layer composition and by the conditions at the interface. This work deals with the possibilities of different depth profile analysis methods for the study of TiNx and TiCx layers on hard metal and steel substrates prepared by plasma assisted CVD technique, and furthermore it demonstrates the performance of factor analysis for detailed investigation of a multilayer system consisting of amorphous C and TiCx single layers.
The hard materials coatings were investigated by different methods of depth profile analysis, which may be an important tool in the research of thin layer deposition for wear applications. The following techniques were used: GDOES, analytical TEM, electron microdiffraction and AUGER electron spectroscopy. By means of the combined application of energy dispersive X-ray spectrometry and microdiffraction a correlation of the depth profiles of both elemental concentrations and lattice parameters in TiCx coatings could be revealed.
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Dedicated to Professor Dr. rer. nat. Dr. h.c. Hubertus Nickel on the occasion of his 65th birthday
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Wetzig, K., Endler, I. Depth profile analysis of plasma assisted CVD hard materials coatings. Mikrochim Acta 125, 121–125 (1997). https://doi.org/10.1007/BF01246173
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DOI: https://doi.org/10.1007/BF01246173