Surface and interface analysis of titanium nitride diffusion barriers

Abstract

Titanium nitride films were produced on silicon substrate by ion beam assisted deposition in the alternate mode: first, thin titanium layers were deposited by electron beam evaporation and then titanium nitride was formed by nitrogen implantation at room temperature; this cycle was then iterated many times in order to obtain thicker titanium nitride layers. The obtained films were characterized with respect to atomic composition by Rutherford backscattering spectrometry and nuclear reaction analysis techniques, while chemical bonding was investigated by Auger line-shape analysis. We observe that nitrogen implantation, along with the production of titanium nitride, induces silicon migration into the film. Silicon transport is connected to point defects produced by ion implantation as well as by chemical driving forces associated with silicides formation.