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Quantitative structural analysis using interference layer metallography

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Summary

This presentation describes the possibilities, but also the limitations and errors, of the quantitative structural analysis of metallic multi-phase systems by means of interference layer metallography. The following aspects are considered in detail:

  • -effect of interfering layers,

  • -structural development by gas ion etching and evaporation coatings,

  • -application of quantitative structural analysis with the example of a high-temperature metallic alloy,

  • -determination of the optical constants of all phases involved in the structure and the coating materials,

  • -criteria for selecting coating materials; possibilities of preselecting the thickness of the interference layer and the wavelength of the monochromatic observation light,

  • -sources of error and limitations of the colour-contrast method.

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References

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Authors and Affiliations

  1. Institut für Reaktorwerkstoffe der Kernforschungsanlage Jülich GmbH, Jülich, F. R. G.

    J. Linke, H. Hoven, K. Koizlik & K. Schmidt

Authors
  1. J. Linke
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  2. H. Hoven
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  3. K. Koizlik
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  4. K. Schmidt
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Linke, J., Hoven, H., Koizlik, K. et al. Quantitative structural analysis using interference layer metallography. Mikrochim Acta 86, 15–30 (1985). https://doi.org/10.1007/BF01203004

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  • DOI: https://doi.org/10.1007/BF01203004

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