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High resolution auger electron spectroscopy for materials characterization

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Abstract

High resolution Auger microanalysis has become a widely applied technique in various fields of materials research. Its submicrometer spatial resolution is shown as being advantageous for surface, interface and thin film analysis. Limitations of the lateral resolution are outlined with respect to influences of electron backscattering, detection sensitivity, sample drift, beam heating and other electron induced processes. High in-depth resolution is linked with high spatial resolution for optimized depth profiling by sputtering. Crater edge profiling with scanning Auger microscopy is particularly useful for obtaining a three-dimensional microanalysis. Some examples demonstrate the capabilities and limitations in the analysis of precipitates, fracture surfaces and multilayer structures.

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  1. Max-Planck-Institut für Metallforschung, Institut für Werkstoffwissenschaften, Seestrasse 92, D-7000, Stuttgart 1, Federal Republic of Germany

    Siegfried Hofmann

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  1. Siegfried Hofmann
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Hofmann, S. High resolution auger electron spectroscopy for materials characterization. Mikrochim Acta 91, 321–345 (1987). https://doi.org/10.1007/BF01199509

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