Summary
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1.
A general method of photochemical chlorination of alkylchlorosilanes and chlorodisilaalkanes was studied for numerous cases. It gives high yields of monochloro derivatives, this being attained by carrying out the chlorination in a simple apparatus in which the monochloro derivative formed is continuously removed from the reaction zone and does not again come into contact with chlorine.
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2.
It was shown that this method of chlorination has advantages over chlorination with sulfuryl chloride, both as regards generality and as regards the high yield and purity of the monochloro derivatives formed. The method has advantages also over chlorination in the liquid phase and these are particularly notable in the preparation of the previously inaccessible ClCH2SiCl3 from CH3SiCl3.
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3.
On the basis of our own results and data in the literature, the main laws governing chlorination, both with chlorine and with sulfuryl chloride, were formulated.
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Mironov, V.F., Ponornarenko, V.A. Some regularities observed in the chlorination of organosilicon compounds. Russ Chem Bull 6, 211–218 (1957). https://doi.org/10.1007/BF01170555
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DOI: https://doi.org/10.1007/BF01170555