Abstract
The nucleation and growth of undoped gallium arsenide (GaAs) epitaxial layers, grown by metalorganic vapour phase epitaxy (MOVPE) on Si (111) substrates were investigated by transmission electron microscopy (TEM). The initial stages of epitaxial growth are considered at high and low growth temperatures. The influence of growth time and thermal annealing on the initial stages of growth are also studied and reported.
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Alberts, V., Neethling, J.H. & Vermaak, J.S. Nucleation and growth of gallium arsenide on silicon (111). J Mater Sci 29, 2017–2024 (1994). https://doi.org/10.1007/BF01154676
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DOI: https://doi.org/10.1007/BF01154676