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Ion-based methods for optical thin film deposition

Journal of Materials Science volume 21, pages 1–25 (1986)Cite this article

Abstract

The optical properties of the dielectric oxide films SiO2, Al2O3, TiO2, ZrO2, CeO2 and Ta2O5 produced by ion-based techniques have been reviewed. The influence of ion bombardment during deposition is discussed in some detail and the various production techniques are described. Recent results on the deposition and properties of diamond-like carbon films are also reviewed. Finally, some examples of the practical applications of high quality dielectric oxide films are given.

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Martin, P.J. Ion-based methods for optical thin film deposition. J Mater Sci 21, 1–25 (1986). https://doi.org/10.1007/BF01144693

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