Journal of Materials Science

, Volume 24, Issue 9, pp 3087–3090 | Cite as

Effect of substrate temperature and film thickness on the surface structure of some thin amorphous films of MoO3 studied by X-ray photoelectron spectroscopy (ESCA)

  • M. Anwar
  • C. A. Hogarth
  • R. Bulpett


X-ray photoelectron spectroscopy (XPS) core level spectra of MoO3 substoichiometric amorphous thin films in the thickness range 100 to 670 nm were studied as a function of thickness. Some samples 500 nm thick were studied for different substrate temperatures in the range 293 to 543 K. It was observed that with the increase of thickness of the samples no change in the electron spectrum was observed in the material. Under vacuum conditions, MoO3 turned blue when the substrate temperature was higher than 373 K. XPS spectra supported the formation of the Mo5+ oxidation state in the blue samples. Blue coloration was observed after heating in vacuum and this was attributed to an internal electron transfer from oxygen to metallic orbitals by thermal ionization creating an Mo5+ oxidation state.


Oxidation State Substrate Temperature MoO3 Electron Spectrum Vacuum Condition 
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Copyright information

© Chapman and Hall Ltd 1989

Authors and Affiliations

  • M. Anwar
    • 1
  • C. A. Hogarth
    • 1
  • R. Bulpett
    • 2
  1. 1.Department of PhysicsBrunel UniversityUxbridgeUK
  2. 2.Experimental Techniques CentreBrunel UniversityUxbridgeUK

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