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Grain growth in copper and alpha-brasses

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Abstract

The wires of 99.999% copper and alpha-brasses containing 12, 20, 30 and 35 at % Zn have been annealed in vacuum for 30 to 240 min at 873, 923, 973 and 1023 K. The grain-growth data obtained are well encompassed by the relationD 2, —D 20 , =Kt exp(-H/kT), whereD is the instantaneous mean grain diameter at the time,t, of isothermal anneal andD 0 refers to the initial mean grain diameter. In alpha-brasses the activation energy for grain-boundary self-diffusion,H, and the pre-exponential factor,K, depends on the zinc concentration,c, asH = (H 0 — 1.1c) eV andK =K 0 exp(-10.7c) cm2 sec−1. The values ofH 0 andK 0, referred to the base metal are respectively 0.87 eV and 3.0 × 10−4 cm2 sec−1, which are in good agreement with those (0.85 eV and 3.6 × 10−4 cm2 sec−1) found for copper.

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Ghauri, I.M., Butt, M.Z. & Raza, S.M. Grain growth in copper and alpha-brasses. J Mater Sci 25, 4782–4784 (1990). https://doi.org/10.1007/BF01129942

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