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Translated from Kibernetika i Sistemnyi Analiz, No. 3, pp. 137–146, May–June, 1993.
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Derkach, V.P., Medvedev, I.V., Khodakovskii, N.I. et al. Modeling of processes in tunneling lithography. Cybern Syst Anal 29, 420–428 (1993). https://doi.org/10.1007/BF01125548
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DOI: https://doi.org/10.1007/BF01125548